PhD position in Femtosecond-laser-induced generation of terahertz light + ultrasound in metals
Universiteit van Amsterdam
Amsterdam, Netherlands
2 dagen geleden

At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography.

We contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature.

What are you going to do?

Irradiating metals with femtosecond laser pulses generates terahertz light and ultrasound. While this is well-established experimentally, the underlying processes are still highly debated.

In this PhD project you will investigate these processes, in order to disentangle and decide between the various proposed mechanisms.

You will perform targeted experiments on a variety of structured samples, and compare the results to different theoretical models.

Two examples of recently proposed different mechanisms are ponderomotive forces on the one hand, and quantum pressure gradients on the other hand.

By judicious choice of samples, for instance involving metals with different electron-phonon coupling, you will be able to elucidate the role of the various mechanisms at play.

In addition to the fundamental interest in the processes underlying the generation of THz light and ultrasound in metals, the work is also relevant for practical applications such as subsurface inspection in the context of nanolithography.

What do we require?

You have an MSc in (applied) physics. Knowledge in the fields of optical physics or laser physics and solid-state physics is advantageous.

Good verbal and written communication skills (in English) are required.

Our offer

A temporary contract for 38 number of hours per week for the duration of 4 years (initial appointment will be for a period of 18 months and after satisfactory evaluation it can be extended for a total duration of 4 years) and should lead to a dissertation (PhD thesis).

We will draft an educational plan that includes attendance of courses and (international) meetings. We also expect you to assist in teaching undergraduates and master students.

The salary, depending on relevant experience before the beginning of the employment contract, will be €2,325 to €2,972 (scale P) gross per month, based on full-time employment (38 hours a week).

These amounts are exclusive 8 % holiday allowance and 8,3 % end-of-year bonus. A favorable tax agreement, the 30% ruling’, may apply to non-Dutch applicants.

The Collective Labour Agreement of Dutch Universities is applicable.

Are you curious about our extensive package of secondary employment benefits? Then find out more about working at the Faculty of Science.

Questions?

Do you have questions about this vacancy? Or do you want to know more about our organisation? Please contact :

  • prof. Paul Planken
  • T : +31 (0)20 851 7100

  • dr Klaasjan van Druten
  • About the group

    The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.

    ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML.

    ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff.

    This project is a new collaborative effort between the Institute of Physics at the University of Amsterdam and ARCNL. You will be embedded in the EUV Targets group at ARCNL, which frequently interacts with our industrial partner ASML.

    The research activities of the EUV Targets group mainly take place in the general area of 'metrology' and cover both fundamental research and real-life applications of that research.

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